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Title:
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Silicon solar cells textured by reactive ion etching with natural lithography
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Author(s):
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Published by:
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Publication date:
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ECN
Solar Energy
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1-5-2000
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ECN report number:
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Document type:
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ECN-RX--00-012
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Conference Paper
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Number of pages:
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Full text:
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4
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Download PDF
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Presented at: 16th European Photovoltaic Solar Energy Conference and Exhibition, Glasgow, Scotland, 1-5 mei 2000.
Abstract:
Several groups have demonstrated that Reactive Ion Etching (RIE) cantexture multi- crystalline silicon very well. Moreover RIE texturing can be
integrated quite easily into existing process sequences. Whether this can be
done cost effectively is still uncertain. In this work we apply RIE etching
after deposition of a mask. The mask is a well defined microscopic mask that
is created by self-organised processes. The mask geometry and etch conditions
can be varied to create different kinds of periodic textures. Using these
techniques we achieved a reproducible and homogeneous RIE texture on full
size multi-crystalline silicon wafers. We achieved a .24% absolute efficiency
gain by RIE over non- textured cells. RIE textured cells with an efficiency
of 14.8% were made using an industrial type process sequence. 16 refs.
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