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Title:
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Back Contacted a-Si:H/c-Si Heterostructure Solar Cells
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Author(s):
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Tucci, M.; Serenelli, L.; Salza, E.; Iuliis, S. de; Geerligs, L.J.; Caputo, D.; Ceccarelli, M.; Cesare, G. de
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Published by:
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Publication date:
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ECN
Solar Energy
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30-5-2007
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ECN report number:
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Document type:
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ECN-M--07-050
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Conference Paper
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Number of pages:
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Full text:
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5
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Download PDF
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Presented at: ICANS 22 Symposium, Breckenridge, USA, 19-24 augustus 2007.
Abstract:
This paper shows how the amorphous/crystalline silicon technology can be implemented in the interdigitated back contact solar cell design. We have fabricated rear-junction, backside contact cells in which both the emitter and the back contact are formed by amorphous/crystalline silicon heterostructure, and the grid-less textured front surface is passivated by a double layer of amorphous silicon and silicon nitride, which also provides an anti-reflection coating. The entire self-aligned mask and photolithography-free process is performed at temperature below 300 C with the aid of one metallic mask to create the interdigitated pattern. An open circuit voltage of 687 mV has been measured on a 0.5 Xcm p-type monocrystalline silicon wafer. On the other hand, several technological aspects that limit the fill factor (50%) and the short circuit current density (32 mA/cm2) still need improvement. We show that the uniformity of the deposited amorphous silicon layers is not influenced by the mask-assisted deposition process and that the alignment is feasible. Moreover, this paper investigates the photocurrent limiting factors by one-dimensional modeling and quantum efficiency measurements. copyright 2008 Elsevier B.V. All rights reserved.
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