| Title: | 
        
            | Ribbon-Growth-on-Substrate : progress in high-speed crystalline silicon wafer manufacturing | 
        
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            | Author(s): | 
        
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            | Published by: | Publication date: | 
        
            | ECN
                Solar Energy | 1-7-2002 | 
        
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            | ECN report number: | Document type: | 
        
            | ECN-RX--02-023 | Conference Paper | 
        
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            | Number of pages: | Full text: | 
        
            | 4 | Download PDF | 
    
    
        Presented at: 29th IEEE Photovoltaic Specialists Conference, New Orleans, USA, 20-24 mei 2002.
        
        
    
    
        Abstract:
        The Ribbon-Growth-on-Substrate (RGS) silicon wafer manufacturing technologyis the most promising high-speed wafer production technique under development
at
the moment. It has the promise to lead to a manufacturing technology,
which allows silicon wafer manufacturing at the 25 MWp/a to 50 MWpla
level.
A future development of this technology in the areas, RGS machine prototyping,
wafer quality improvement and solar cell process optimization should
lead to a commercialization of this technology in 2005. In the following
a status of the RGS technology today and the most probable road ahead
is outlined.
    
    
        
        
    
    
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