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ECN publication
Silicon Nitride at High Deposition Rate by Hot-Wire Chemical Vapor Deposition as Passivating and Antireflection Layer on Multicrystalline Silicon Solar Cells
Weeber, A.W.; Rieffe, H.C.; Soppe, W.J.; Werf, C.H.M. van der; Goldbach, H.D.; Löffler, J.; Scarfó, A.; Kylner, A.M.C.; Stannowski, B.; Arnoldbik, W.M.; Rath, J.K.; Schropp, R.E.I.
Published by: Publication date:
ECN Solar Energy 1-8-2004
ECN report number: Document type:
ECN-RX--04-098 Conference Paper
Number of pages: Full text:
4 Download PDF  

Presented at: 3rd International Conference on Hot-Wire CVD (Cat-CVD) Process, Utrecht, The Netherlands, 23-27 augustus 2004.

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