Title:
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Very low surface recombination velocities on 2.5 cm Si wafers, obtained with low-temperature PECVD of Si-oxide and Si-nitride
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Author(s):
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Leguijt, C.; Lölgen, P.; Eikelboom, J.A.; Amesz, P.H.; Steeman, R.A.; Sinke, W.C.; Sarro, P.M.; Verhoef, L.A.; Michiels, P.P.; Chen, Z.H.; Rohatgi, A.
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Published by:
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Publication date:
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ECN
ECN
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1993
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ECN report number:
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Document type:
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ECN-RX--93-098
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Other
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Number of pages:
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Full text:
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3
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Download PDF
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Abstract:
No summary available.
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