ECN publication
Exploring the surface passivation of oxides on silicon by pulsed laser deposition
Published by: Publication date:
ECN Solar Energy 1-10-2001
ECN report number: Document type:
ECN-RX--01-015 Conference Paper
Number of pages: Full text:
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Presented at: 17th European Photovoltaic Solar Energy Conference, Munich, Germany, 22-26 oktober 2001.

In the effort of combining antireflective and passivating properties in one coating for the use on silicon solar cells, we are exploring the possibilities of introducing passivating qualities in oxide coatings by pulsed laser deposition. Pulsed Laser Deposition (PLD) is known for its flexibility in (independently) changing the deposition parameters, which offers one the possibility to deposit coatings in a broad range of deposition parameters. To unravel why coatings show surface passivation, effort is undertaken to determine the extent and content of the interface between the coating and silicon substrate.

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