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ECN publication
Title:
Ribbon-Growth-on-Substrate : progress in high-speed crystalline silicon wafer manufacturing
 
Author(s):
Schönecker, A.; Laas, L.J.; Gutjahr, A.; Wyers, G.P.; Reinink, A.; Wiersma, B.
 
Published by: Publication date:
ECN Solar Energy 1-7-2002
 
ECN report number: Document type:
ECN-RX--02-023 Conference Paper
 
Number of pages: Full text:
4 Download PDF  

Presented at: 29th IEEE Photovoltaic Specialists Conference, New Orleans, USA, 20-24 mei 2002.

Abstract:
The Ribbon-Growth-on-Substrate (RGS) silicon wafer manufacturing technologyis the most promising high-speed wafer production technique under development at the moment. It has the promise to lead to a manufacturing technology, which allows silicon wafer manufacturing at the 25 MWp/a to 50 MWpla level. A future development of this technology in the areas, RGS machine prototyping, wafer quality improvement and solar cell process optimization should lead to a commercialization of this technology in 2005. In the following a status of the RGS technology today and the most probable road ahead is outlined.


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