Title:
|
Silicon Nitride at High Deposition Rate by Hot-Wire Chemical Vapor Deposition as Passivating and Antireflection Layer on Multicrystalline Silicon Solar Cells
|
|
Author(s):
|
Weeber, A.W.; Rieffe, H.C.; Soppe, W.J.; Werf, C.H.M. van der; Goldbach, H.D.; Löffler, J.; Scarfó, A.; Kylner, A.M.C.; Stannowski, B.; Arnoldbik, W.M.; Rath, J.K.; Schropp, R.E.I.
|
|
Published by:
|
Publication date:
|
ECN
Solar Energy
|
1-8-2004
|
|
ECN report number:
|
Document type:
|
ECN-RX--04-098
|
Conference Paper
|
|
Number of pages:
|
Full text:
|
4
|
Download PDF
|
Presented at: 3rd International Conference on Hot-Wire CVD (Cat-CVD) Process, Utrecht, The Netherlands, 23-27 augustus 2004.
Abstract:
No summary available.
Back to List