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ECN publication
Title:
Crystalline silicon growth on silicon nitride and oxynitride substrates for thin film solar cells
 
Author(s):
Gutjahr, A.; Grasso, C.; Schiermeier, S.E.A.; Keitz, A. von; Fung, P.F.
 
Published by: Publication date:
ECN Solar Energy 1-5-2000
 
ECN report number: Document type:
ECN-RX--00-013 Conference Paper
 
Number of pages: Full text:
4 Download PDF  

Presented at: 16th European Photovoltaic Solar Energy Conference and Exhibition, Glasgow, Scotland, 1-5 mei 2000.

Abstract:
Si infiltrated SiAlON substrates were tape-casted and sintered froma SiAlON slurry with additional crystalline Si. The crystalline Si in the matrix of the substrate acts as seeds for epitaxial growth. Silicon layers were deposited by liquid phase epitaxy on these substrates. A closed layer could be grown from a saturated Ga/Al solution on Si infiltrated SiAlON with 42% Si. The crystals forming the layer are faceted and reach sizes of more than 100 mum in diameter. This layer is highly p doped because of the incorporation of Ga and Al. 11 refs.


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