|
Title:
|
|
Wet chemical etching for crystalline silicon solar cells
|
|
|
|
Author(s):
|
|
|
|
|
|
Published by:
|
Publication date:
|
|
ECN
Solar Energy
|
19-6-2006
|
|
|
|
ECN report number:
|
Document type:
|
|
ECN-RX--06-064
|
Conference Paper
|
|
|
|
Number of pages:
|
Full text:
|
|
4
|
Download PDF
|
Presented at: 5th International Workshop on Physical Chemistry of Wet Etching of Semiconductors PCWECS, Saarbrücken, Germany, 19-21 juni 2006.
Abstract:
Alkaline etching is frequently used in the processing of silicon into solar cells. High temperatures (above 100°C) and concentrations (> 10 M) of typically NaOH or KOH solutions are used for the fast removal of saw-damage for the wafers as-cut from the ingot. At low concentrations (less than 10 M)
and temperatures (< 100°C) these solutions are used particularly on monocrystalline (100) oriented silicon wafers for the formation pyramidal etch structures having excellent anti-reflective properties.
Back to List