|
Title:
|
|
Carbon footprint of PECVD chamber cleaning
|
|
|
|
Author(s):
|
|
|
|
|
|
Published by:
|
Publication date:
|
|
ECN
Solar Energy
|
28-11-2008
|
|
|
|
ECN report number:
|
Document type:
|
|
ECN-W--08-063
|
Article (scientific)
|
|
|
|
Number of pages:
|
|
|
6
|
|
Published in: Photovoltaics International (PV-Tech), , 2008, Vol.2, p.64-69.
Abstract:
The use of perfluorinated gases such as NF3, CF4 or SF6 for PECVD (plasma enhanced chemical vapor deposition) chamber cleaning has a much higher impact on global warming than does the use of onsite-generated F2. This holds true even when supposing that in the future much more effort is paid for the correct abatement and a leak-free supply and take-back chain. This paper will discuss the steps available to the PV industry for control and reduction of carbon emissions in the chamber cleaning process.
More Information:
Back to List