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ECN publication
Title:
Carbon footprint of PECVD chamber cleaning
 
Author(s):
Schottler, M.; Wild - Scholten, M.J. de
 
Published by: Publication date:
ECN Solar Energy 28-11-2008
 
ECN report number: Document type:
ECN-W--08-063 Article (scientific)
 
Number of pages:
6  

Published in: Photovoltaics International (PV-Tech), , 2008, Vol.2, p.64-69.

Abstract:
The use of perfluorinated gases such as NF3, CF4 or SF6 for PECVD (plasma enhanced chemical vapor deposition) chamber cleaning has a much higher impact on global warming than does the use of onsite-generated F2. This holds true even when supposing that in the future much more effort is paid for the correct abatement and a leak-free supply and take-back chain. This paper will discuss the steps available to the PV industry for control and reduction of carbon emissions in the chamber cleaning process.

More Information:

http://www.pv-tech.org

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