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Title:
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Silicon solar cells structured by reactive ion etching and processed with screen printing
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Author(s):
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Published by:
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Publication date:
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ECN
Solar Energy
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1-7-1998
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ECN report number:
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Document type:
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ECN-RX--98-037
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Article (scientific)
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Number of pages:
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4
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Published in: Paper, presented at the 2nd World conference and exhibition on photovoltaic solar energy conversion, Vienna, Austria, 6-10 July (), , , Vol., p.-.
Abstract:
Reactive Ion Etching (RIE) can texture multicrystalline silicon wafersvery well. RIE has the advantage over alkaline etches that it is not
sensitive to the crystallographic orientation. RIE has the advantage over
acid etches that it can be controlled much better. This work describes
multicrystalline silicon solar cells textured by RIE and processed with an
industrial process sequence consisting of mainly screen-printing steps. We
also made mini-modules of the RIE textured cells. The RIE texturing
parameters can be varied to give different textures. Care must be taken that
the texture is sufficiently rough to give a low encapsulated reflectance but
not so rough that carriers generated by light absorbed in the texture
recombine at the surface and cannot be collected at the p-n junction. The
screen printing on RIE textured cells was successful. We were able to make
cells with both low reflectance and good quantum efficiency. Due to
encapsulation problems we were not able to demonstrate an efficiency gain
yet. 10 refs.
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