Publications

Skip Navigation Links.
Recently Published
Collapse per documenttypeper documenttype
Expand ECN publicationECN publication
Expand BookBook
Expand ArticleArticle
Expand Article (scientific)Article (scientific)
Collapse Conference PaperConference Paper
2018
2017
2016
2015
2014
2013
2012
2011
2010
2009
2008
2007
2006
2005
2004
2003
2002
2001
2000
1999
1997
1996
1995
1993
1992
1991
1990
Expand PresentationPresentation
Expand OtherOther
Expand External memoExternal memo
Expand LeafletLeaflet
Expand per Unitper Unit
Expand per Clusterper Cluster

Search for publications:


Limit search to the fields

ECN publication
Title:
Microwave PECVD of micro-crystalline silicon
 
Author(s):
Soppe, W.J.; Devilee, C.; Schiermeier, S.E.A.; Biebericher, A.C.W.; Donker, H.; Rath, J.K.
 
Published by: Publication date:
ECN Solar Energy 1-5-2002
 
ECN report number: Document type:
ECN-RX--02-019 Conference Paper
 
Number of pages: Full text:
4 Download PDF  

Presented at: 29th IEEE Photovoltaic Specialists Conference, New Orleans, USA, 20-24 mei 2002.

Abstract:
The deposition of micro-crystalline silicon with a new linear microwaveplasma source is investigated. Advantages of this plasma source are the high depositions rates and the large area on which a homogeneous deposition can be achieved. Since this source has not yet been applied for depositions of micro-crystalline silicon before, we explored a large parameter space in order to find optimum growth conditions. It is observed that with this microwave source it is possible to grow micro-crystalline layers at higher silane/hydrogen ratios and deposition rates than for conventional RF PECVD. In this paper, structural properties of silicon layers deposited by microwave assisted PECVD are discussed.


Back to List